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碳化硅中子辐照缺陷的仿真研究

中文摘要英文摘要

本文使用Geant4仿真工具,研究了受到0.1 MeV至1 MeV不同辐照能量的碳化硅材料中位移缺陷的能谱以及它的反应过程。根据仿真发现,辐照能量的增加会导致不同移位缺陷占比的改变,缺陷能谱的能量范围展宽。同时使用LAMMPS仿真工具,对7.5 KeV的Si PKA、3.5 KeV的C PKA产生的级联碰撞进行仿真,发现经过热力学演化,缺陷会产生次级级联碰撞,使得缺陷浓度增加,且产生缺陷团簇。本研究从不同仿真角度揭示了快中子辐照对碳化硅材料产生的影响,为提高器件的抗辐照性能提供了理论依据。

In this paper, we employs Geant4 simulation tools to investigate the energy spectrum of displacement defects and their reaction processes in silicon carbide materials subjected to different irradiation energies ranging from 0.1 MeV to 1 MeV. Simulation results reveal that increasing irradiation energy leads to changes in the proportion of different displacement defects and broadens the energy range of the defect spectrum. Concurrently, LAMMPS simulation tools were utilized to simulate cascade collisions generated by 7.5 keV Si PKA and 3.5 keV C PKA. The findings indicate that following thermodynamic evolution, defects produce secondary cascade collisions, resulting in increased defect concentration and the formation of defect clusters. This research elucidates the effects of fast neutron irradiation on silicon carbide materials from different simulation perspectives, providing a theoretical basis for enhancing the radiation resistance of devices.

孟淑琦、夏晓川

大连理工大学集成电路学院,大连 116620大连理工大学集成电路学院,大连 116620

原子能技术基础理论粒子探测技术、辐射探测技术、核仪器仪表材料科学物理学

半导体技术中子辐照辐照损伤碳化硅

semiconductor technologyneutron irradiationirradiation damagesilicon carbide

孟淑琦,夏晓川.碳化硅中子辐照缺陷的仿真研究[EB/OL].(2025-04-22)[2025-04-26].http://www.paper.edu.cn/releasepaper/content/202504-188.点此复制

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