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Free-Space Characterization Setup for Low-Loss UV-261nm Waveguides in Aluminum Oxide

Free-Space Characterization Setup for Low-Loss UV-261nm Waveguides in Aluminum Oxide

来源:Arxiv_logoArxiv
英文摘要

Here, we report a characterization setup for low-loss integrated photonic waveguides in aluminum oxide, tailored for deep UV applications. The setup includes a 261nm UV light source, objective lenses for free-space coupling, an automated stage, and a UV camera. The measured losses for the aluminum oxide waveguides in the UV-261nm range were calculated to be 4.9485 dB/cm. These results demonstrate the effectiveness of the setup in achieving low-loss characterization of integrated photonics waveguides for deep UV applications.

Vahram Voskerchyan、Ward Hendriks、Sonia Garcia Blanco

光电子技术

Vahram Voskerchyan,Ward Hendriks,Sonia Garcia Blanco.Free-Space Characterization Setup for Low-Loss UV-261nm Waveguides in Aluminum Oxide[EB/OL].(2025-06-16)[2025-07-16].https://arxiv.org/abs/2506.13227.点此复制

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