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Scalable quantum current source on commercial CMOS process technology

Scalable quantum current source on commercial CMOS process technology

来源:Arxiv_logoArxiv
英文摘要

Many quantum technologies require a precise electrical current standard that can only be achieved with expensive cryogenics, or through the secondary standards, such as resistance or voltage. Silicon-based charge pumps could provide such a standard in an inherently scalable way, through their compatibility with complementary metal-oxide-semiconductor (CMOS) fabrication methods. However, coherent quantized charge transfer has so far been demonstrated only in nanoscale devices that are custom-fabricated in academic cleanrooms or research technology foundries. Here, we show that a CMOS device manufactured with commercial 22-nm process node can be used to define a quantum current standard in the International System of Units (SI). We measure an accuracy of (1.2 +/- 0.1)E-3 A/A at 50 MHz with reference to SI voltage and resistance standards in a pumped helium system. We then propose a practical monolithic CMOS chip that incorporates one million parallel connected charge pumps along with on-chip control electronics. This chip could be operated as a table-top primary standard that can be easily integrated with CMOS electronics, generating quantum currents of up to microampere levels.

Suyash Pati Tripathi、Owen Brace、Wee Han Lim、Dimitrios Georgakopoulos、MengKe Feng、Steve Yianni、Ensar Vahapoglu、Md Mamunur Rahman、Shai Bonen、Jonathan Y. Huang、Kok Wai Chan、Arne Laucht、Andre Saraiva、Christopher C. Escott、Sorin P. Voinigescu、Andrew S. Dzurak、Tuomo Tanttu、Ajit Dash、Andrea Morello、Will Gilbert

微电子学、集成电路电子元件、电子组件电气测量技术、电气测量仪器

Suyash Pati Tripathi,Owen Brace,Wee Han Lim,Dimitrios Georgakopoulos,MengKe Feng,Steve Yianni,Ensar Vahapoglu,Md Mamunur Rahman,Shai Bonen,Jonathan Y. Huang,Kok Wai Chan,Arne Laucht,Andre Saraiva,Christopher C. Escott,Sorin P. Voinigescu,Andrew S. Dzurak,Tuomo Tanttu,Ajit Dash,Andrea Morello,Will Gilbert.Scalable quantum current source on commercial CMOS process technology[EB/OL].(2025-07-07)[2025-07-22].https://arxiv.org/abs/2506.15956.点此复制

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