Second-order microscopic nonlinear susceptibility in a centrosymmetric material: application to imaging valence electron motion
Second-order microscopic nonlinear susceptibility in a centrosymmetric material: application to imaging valence electron motion
We report measurements of phase-matched nonlinear x-ray and optical sum-frequency generation from single-crystal silicon using sub-resonant 0.95 eV laser pulses and 9.5 keV hard x-ray pulses from the LCLS free-electron laser. The sum-frequency signal appears as energy and momentum sidebands to the elastic Bragg peak. It is proportional to the magnitude squared of the relevant temporal and spatial Fourier components of the optically induced microscopic charges/currents. We measure the first- and second-order sideband to the 220 Bragg peak and find that the efficiency is maximized when the applied field is along the reciprocal lattice vector. For an optical intensity of $\sim10^{12} \text{W}/\text{cm}^2$, we measure peak efficiencies of $3\times 10^{-7}$ and $3\times 10^{-10}$ for the first and second-order sideband respectively (relative to the elastic Bragg peak). The first-order sideband is consistent with induced microscopic currents along the applied electric field (consistent with an isotropic response). The second-order sideband depends nontrivially on the optical field orientation and is consistent with an anisotropic response originating from induced charges along the bonds with C$_{3v}$ site symmetry. The results agree well with first-principles Bloch-Floquet calculations.
Chance Ornelas-Skarin、Tatiana Bezriadina、Matthias Fuchs、Shambhu Ghimire、J. B. Hastings、Quynh L Nguyen、Gilberto de la Peña、Takahiro Sato、Sharon Shwartz、Mariano Trigo、Diling Zhu、Daria Popova-Gorelova、David A. Reis
非线性科学物理学
Chance Ornelas-Skarin,Tatiana Bezriadina,Matthias Fuchs,Shambhu Ghimire,J. B. Hastings,Quynh L Nguyen,Gilberto de la Peña,Takahiro Sato,Sharon Shwartz,Mariano Trigo,Diling Zhu,Daria Popova-Gorelova,David A. Reis.Second-order microscopic nonlinear susceptibility in a centrosymmetric material: application to imaging valence electron motion[EB/OL].(2025-07-01)[2025-07-16].https://arxiv.org/abs/2507.00441.点此复制
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