Spin injection in Si-based ferromagnetic tunnel junctions with MgO/MgAl2O4 barriers:Experimental and theoretical investigation of barrier thickness-dependent spin tunneling efficiency

We have experimentally and theoretically investigated the spin transport in Fe/Mg/MgO/MgAl2O4/n+-Si(001) ferromagnetic tunnel junctions on a Si substrate, by systematically varying the thickness combination of amorphous MgO and MgAl2O4 tunnel barrier layers with a sliding shutter between the evaporation sources and substrate during electron-beam evaporation. A technical advantage of MgAl2O4 is that a continuous and flat thin film is realized on a Si substrate even when the MgAl2O4 thickness is as thin as 0.5 nm, unlike MgO, which enables us to examine the spin transport in a thinner range of the tunnel barrier thickness. Our distinct finding is as follows: When the Fe/Mg/MgO interface is used on the top side, the spin polarization PS of tunneling electrons increases at 10 K as the total MgO/MgAl2O4 tunnel barrier thickness (tox = 0.47 - 1.4 nm) is increased, regardless of different thickness combinations, and PS shows saturation-like behavior when tox is above 1.1 nm. Since this feature cannot be explained by the well-known conductivity mismatch in semiconductor-based ferromagnetic tunnel junctions, we propose a simple phenomenological tunneling model based on two different direct tunneling paths, which have higher/lower spin polarizations with longer/shorter decay lengths. Our numerical calculation reproduces the relationship between the spin polarization PS and total tunnel barrier thickness tox in the experiments, indicating that the dominant mechanism is an increasing contribution of the lower spin polarization path as tox is decreased. We discuss possible origins for this phenomenon including intrinsic and extrinsic tunneling mechanisms. Our analysis method provides an insight into the detailed spin transport physics in semiconductor-based ferromagnetic junctions, particularly, with a very thin tunnel barrier layer.