Magnetic and magnetocaloric properties of the amorphous Tb$_{31}$Co$_{69}$ and Dy$_{31}$Co$_{69}$ thin films deposited on Si substrates
Magnetic and magnetocaloric properties of the amorphous Tb$_{31}$Co$_{69}$ and Dy$_{31}$Co$_{69}$ thin films deposited on Si substrates
We present the structural, magnetic, and magnetocaloric properties of amorphous thin films Tb-Co and Dy-Co with stoichiometry Tb$_{31}$Co$_{69}$ and Dy$_{31}$Co$_{69}$, deposited on naturally oxidized silicon Si (100) substrates. Samples with a thickness $d=50$ nm covered with a protective Au overlayer with a thickness $d_{\rm Au} =5 $ nm were produced using the pulsed laser deposition technique. The X-ray diffraction analysis indicated the presence of a crystallized Laves phase in the prepared materials. Magnetization measurements as a function of temperature revealed ferrimagnetic behavior in both samples. We estimated the compensation temperature $T_{\rm comp}$ of the amorphous phase for Tb$_{31}$Co$_{69}$ at 81.5 K and for Dy$_{31}$Co$_{69}$ at 88.5 K, while we found the Curie temperature $T_{\rm C,\ Laves}$ of the crystallized Laves phases at 204.5 K and at 117 K, respectively. We investigated the magnetocaloric effect in a wide temperature range, covering $T_{\rm comp}$ of amorphous phases and $T_{\rm C,\ Laves}$ of crystallized Laves phases. The analysis for the magnetic field change of $Îμ_0H=5$ T showed values of the magnetic entropy change of $-ÎS_{\rm M}=4.9$ mJ cm$^{-3}$ K$^{-1}$ at $T_{\rm comp}$ and $-ÎS_{\rm M}=6.6$ mJ cm$^{-3}$ K$^{-1}$ at $T_{\rm C,\ Laves}$ for Tb$_{31}$Co$_{69}$, while for Dy$_{31}$Co$_{69}$, we determined the values of $-ÎS_{\rm M}=35$ mJ cm$^{-3}$ K$^{-1}$ at $T_{\rm comp}$ and $-ÎS_{\rm M}=28$ mJ cm$^{-3}$ K$^{-1}$ at $T_{\rm C,\ Laves}$.
T. Bednarchuk、M. Kowacz、B. Anastaziak、K. Synoradzki、P. Skokowski、M. Matczak、Ł. Frąckowiak
物理学
T. Bednarchuk,M. Kowacz,B. Anastaziak,K. Synoradzki,P. Skokowski,M. Matczak,Ł. Frąckowiak.Magnetic and magnetocaloric properties of the amorphous Tb$_{31}$Co$_{69}$ and Dy$_{31}$Co$_{69}$ thin films deposited on Si substrates[EB/OL].(2025-07-31)[2025-08-07].https://arxiv.org/abs/2507.23555.点此复制
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