多光束干涉影响消除与硅及碳化硅外延层厚度高精度测量
Elimination of Multibeam Interference Effects and High-Precision Thickness Measurement of Silicon and Silicon Carbide Epitaxial Layers
韩佳兵 1袁锡月 1张珺格 1朱旭光2
作者信息
- 1. 辽宁工程技术大学理学院，辽宁省阜新市 123000
- 2. 辽宁工程技术大学创新实践学院计算机教学中心，辽宁省阜新市 123000
- 折叠
摘要
本文核心在于处理多光束干涉对厚度测量的影响。首先，严格推导多光束干涉形成的三个必要条件（厚度均匀性、光程差小于相干长度、界面高反射系数）；其次，建立包含复折射率的精确反射率模型（Airy公式）；接着，采用Levenberg-Marquardt算法，通过最小化理论反射率与实测值的残差平方和，同步优化外延层厚度、折射率实部及消光系数；最后，针对碳化硅数据，通过修正反射率模型与极值点重筛选策略消除多光束干涉影响，实现厚度的高精度反演。
Abstract
The core lies in addressing the influence of multibeam interference on thickness measurement. The solution steps are as follows: first, rigorously derive the three necessary conditions for the formation of multibeam interference (thickness uniformity, optical path difference less than the coherence length, and high reflectivity of the interface); second, establish an accurate reflectivity model incorporating the complex refractive index (Airy\'s formula); third, adopt the Levenberg-Marquardt algorithm to synchronously optimize the epitaxial layer thickness, the real part of the refractive index and the extinction coefficient by minimizing the sum of squared residuals between the theoretical and measured reflectivity values; finally, for silicon carbide data, eliminate the influence of multibeam interference through the modified reflectivity model and the extreme point rescreening strategy to achieve high-precision inversion of thickness.In this paper……….. (10 Points, Times New Roman)关键词
应用物理学/光学干涉测量/多光束干涉/薄膜厚度检测/Airy 公式/L-M 算法Key words
Applied Physics/Optical Interferometry/Multi-beam Interference/Thin Film Thickness Measurement/Airy Formula/L-M Algorithm引用本文复制引用
韩佳兵,袁锡月,张珺格,朱旭光.多光束干涉影响消除与硅及碳化硅外延层厚度高精度测量[EB/OL].(2026-04-22)[2026-04-24].http://www.paper.edu.cn/releasepaper/content/202604-163.学科分类
物理学
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