面向辐射探测应用的4H-SiC SBD器件电学性能仿真与优化
Simulation and Optimization of 4H-SiC SBD devices for radiation detection applications
本文主要研究第三代宽带隙半导体4H-SiC材料制备的核辐射探测器a粒子辐射特性,利用Silvaco-TCAD软件进行了相关电学性能仿真。主要集中在仿真不同外延层掺杂浓度情况下器件反向I-V及C-V特性比较,以及对器件工作电压值的研究。在本文中,同时利用SRIM程序包对器件外延层的厚度进行了仿真优化。根据仿真模拟结果表明,利用5.486MeV的a粒子辐照器件,在材料中的射程约为18.22um;Silvaco-TCAD仿真结果表明,随着外延层掺杂浓度的增加,在相同反偏压下漏电流也随着增加,C-V结果显示随着掺杂浓度的增加,在器件未达到全耗尽时,在相同反偏压下电容随浓度的增加而增大;模拟仿真器件外延层全耗尽时的电压,得到在反向-50V时,器件发生全耗尽,a粒子能量能够全部沉积在外延层中。
In this paper, the radiation characteristics of the a radiation detectors made by the third generation wide band gap semiconductor 4H-SiC materials are studied. The simulation of the electrical properties of 4H-SiC alpha particle detector is carried out by using the software-Silvaco-TCAD. The main purpose foucses on the reverse leakage current and the characteristics of C-V by changing the doping concentration of epitaxial layer; and optimize the reverse voltage about this detector. In this paper, SRIM software is used to simulate the thickness of epitaxial layer. The simulation results show that using the 5.486MeValpha particle irradiates device, the range of particles in the material is about 18.22um; the Silvaco-TCAD simulation results show that with the increase of the doping concentration in the epitaxial layer,the leakage current increases under the same reverse bias, C-V results show that with the increasing of doping concentration, when the device did not reach full depletion,under same reverse bias, the capacitance was increased; In addition, this paper simulates the reverse voltage of this device when the epitaxial is fully depleted, the result is 50V. At this point ,the energy of alpha particle can fully deposit in the detector, thus reduces energy loss.
梁红伟、杜国同、夏晓川、王伟
粒子探测技术、辐射探测技术、核仪器仪表半导体技术
4H-SiCa粒子Silvaco-TCAD探测器
4H-SiCalpha particleSilvaco-TCADDetector
梁红伟,杜国同,夏晓川,王伟.面向辐射探测应用的4H-SiC SBD器件电学性能仿真与优化[EB/OL].(2017-05-16)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/201705-1054.点此复制
评论