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集群磁流变效应微磨头抛光盘的仿真分析及结构优化

Simulation Analysis and Structure Optimization of the Polishing Plate based on the Magnetorheological Effect-Based Tiny-Grinding Wheel Cluster

中文摘要英文摘要

本文提出了集群磁流变效应微磨头抛光盘无抛光垫抛光加工的新工艺方案,推导了磁流变抛光液的基本磁化曲线并得出其基本磁化曲线为近似线性相对磁导率约为2.63的基础上,采用电磁场的有限元分析方法应用Maxwell 2D软件对集群磁流变效应微磨头抛光盘三种设计方案进行了仿真分析,结果表明,磁极相间反向闭合磁路方案具有最佳的磁场分布效果。

new plane polishing technique with the magnetorheological effect-based tiny-grinding wheel cluster is presented in this paper. On the basis of calculating the MR fluid’s B-H curve, which is close to linearity and the relative magnetic permeability is about 2.63, three designs of magnetorheological effect-based tiny-grinding wheel cluster polishing plate are simulation analyzed by using the electromagnetic field finite element technique. The results show that the design where magnetic poles are fixed alternately and contrarily to form closed magnetic circuit has the optimum effect.

阎秋生、汤爱军、高伟强、路家斌

电工基础理论电工技术概论电工材料

集群,磁流变效应微磨头,抛光盘,磁场,仿真

lusterMagnetorheological effect-based tiny-grinding wheelPolishing plateMagnetic fieldSimulation

阎秋生,汤爱军,高伟强,路家斌.集群磁流变效应微磨头抛光盘的仿真分析及结构优化[EB/OL].(2007-08-30)[2025-08-10].http://www.paper.edu.cn/releasepaper/content/200708-463.点此复制

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