氢间隙杂质对CdTe材料电子结构的影响:第一性原理研究
Interstitial Hydrogen Impurity in CdTe: First-principles Study
我们用基于平面波赝势的第一性原理方法,通过计算电子结构、电子局域函数和差分电荷,分析了不同形式的H间隙杂质对Ⅱ-Ⅵ族半导体材料CdTe的电子结构和成键机制的影响。结果表明:H的六角间隙杂质是一个亚稳态,H更容易形成阴阳离子四面体间隙杂质,并倾向于吸附在体系原子上,使得体系原子周围的成键形式发生明显变化,H周围的原子产生比较明显的弛豫。其中,在阴离子间隙时,H吸附到第一近邻Te(TeH)上,能够使TeH -Cdop键有断裂的趋势。而在阳离子间隙时,这种趋势不明显。另外,计算结果表明H在CdTe中具有两性行为,这种两性行为使得费米能级被钉扎在禁带中央并且靠近导带的位置。
he structural and electronic properties of the interstitial hydrogen impurity in CdTe have been studied by plane-wave pseudopotential method based on the density functional theory. Structural relaxation, density of states(DOS), electron localization function(ELF), bonding-charge density and ionizing-charge density have been computed to investigate the effects of the interstitial hydrogen on the electronic structure and bonding mechanism of CdTe. The results of formation energy indicate that H prefers to occupying the tetrahedral interstitial site and bonding to a host atom. Obvious relaxations occur around monatomic hydrogen. As for the anion tetrahedral interstitial, hydrogen tends to break the bond between TeH(adsorbed by H) and Cdop(opposite Cd). Meanwhile, the interstitial hydrogen behaves an amphoteric impurity. The self-compensating effect of interstitial hydrogen impurity pins the Fermi level just above the mid-gap.
陈元平、张凯旺、曲晓东、钟建新、孙立忠
物理学晶体学
H间隙杂质第一性原理dTe形成能ELF
H interstitial impurityfirst-principle methoddTeformation energyELF
陈元平,张凯旺,曲晓东,钟建新,孙立忠.氢间隙杂质对CdTe材料电子结构的影响:第一性原理研究[EB/OL].(2008-11-27)[2025-08-16].http://www.paper.edu.cn/releasepaper/content/200811-824.点此复制
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