原子层沉积技术制备Cu2O薄膜材料的研究进展
dvances in Atomic Layer Deposition of Cu2O Thin Films
本文介绍了原子层沉积技术的原理及优势，概述了原子层沉积技术在Cu2O薄膜材料制备方面的应用，总结了原子层沉积技术影响Cu2O薄膜质量的主要因素。对原子层沉积技术制备的Cu2O薄膜材料及其在光电器件等领域的发展前景进行了展望。
In this paper, the principle and advantages of atomic layer deposition technology are introduced. The application of atomic layer deposition technique in the preparation of Cu2O thin film materials is summarized. The main factors affecting the quality of Cu2O thin films by atomic layer deposition are summarized. The prospects of Cu2O thin film materials prepared by atomic layer deposition technology and its development in optoelectronic devices are prospected.
王晓华、陈子男、李超群、王登魁、潘景薪、姜雪、唐吉龙、方铉
材料科学
u2O薄膜材料原子层沉积光电器件
u2O film materialatomic layer depositionoptoelectronic devices
王晓华,陈子男,李超群,王登魁,潘景薪,姜雪,唐吉龙,方铉.原子层沉积技术制备Cu2O薄膜材料的研究进展[EB/OL].(2016-12-05)[2025-08-30].http://www.paper.edu.cn/releasepaper/content/201612-88.点此复制
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