PWQ方法评估光罩缺陷的研究
Study on photo reticle defect evaluation with PWQ method
本文研究了应用PWQ（Process Window Qualification）方法批量检查28nm产品非金属、金属以及孔洞图形层的光罩缺陷，评估光罩缺陷改善方案等问题的系统性解决方案。通过开发应用光罩缺陷分析软件，使28nm产品非金属和金属图形层等光罩缺陷的批量检查成为可能；通过开发应用电子束扫描(E-beam Inspection)检查接触孔光罩缺陷、开发应用唯独连接孔刻蚀流程，使得孔洞图形的光罩缺陷检查准确有效。PWQ方法是28nm及以下工艺光罩缺陷检查必不可少的方法，对光罩缺陷检查的准确性更高。
his paper aimed the PWQ(Process Window Qualification) method of retical defect inspection on 28nm technology, which can provide an efficient way to monitor the weak point of poly and metal process. The PWQ method that mentioned in this paper, combine with electtical inspection image, can detect contact and via weak point as well. Also, this method can extend to 14nm technology and beyond.
王恺
微电子学、集成电路半导体技术
集成电路制造光罩缺陷光罩缺陷检查
IC manufacturing photo reticle defect photo reticle defect inspection ??
王恺.PWQ方法评估光罩缺陷的研究[EB/OL].(2017-10-16)[2025-08-21].http://www.paper.edu.cn/releasepaper/content/201710-42.点此复制
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