硼底层对溅射制备FePt薄膜有序化和取向的作用
Effect of boron underlayer on ordering and orientation of sputtered FePt film
在室温的单晶Si基片上利用磁控溅射制备了带有B底层的FePt多层薄膜，通过真空退火得到了具有硬磁性的L10相。结构和磁性分析表明，B底层在400 oC以下有利于FePt的相变，而在更高温度下则会抑制金属原子的相互扩散。此外，应当与B原子渗入合金晶格导致的面内张应力有关，底层的添加促进了FePt晶粒的垂直取向，获得了更好的（001）织构，有利于薄膜应用为垂直磁记录材料。
FePt multilayer films with a boron underlayer were prepared on Si (100) substrates using magnetron sputtering, and a subsequent vacuum annealing was carried out to obtain the hard magnetic L10 phase. According to the XRD results, the ordering of the FePt films is facilitated at low annealing temperatures while is blocked at high ones by introducing the boron. Moreover, (001) orientation of the samples is obviously improved by inserting a born underlayer, which is further confirmed by the MFM analysis. The relevant mechanism is discussed by considering the diffusion of boron atoms and a consequential in-plane tensile stress.
陈强、黄安平、陈军养、冯唐福、舒小林、陈子瑜、李永乐
材料科学晶体学金属学、热处理
磁控溅射晶格结构硼底层L10相FePt薄膜磁记录材料
Magnetron sputteringCrystal structureBoron underlayerL10 FePt filmMagnetic recording materials
陈强,黄安平,陈军养,冯唐福,舒小林,陈子瑜,李永乐.硼底层对溅射制备FePt薄膜有序化和取向的作用[EB/OL].(2011-02-18)[2025-08-17].http://www.paper.edu.cn/releasepaper/content/201102-387.点此复制
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