富磷熔体生长InP单晶的均匀性研究
Uniformity of LEC InP single crystals grown from P-rich melt
采用原位磷注入合成法在高压单晶炉内合成富磷的磷化铟( InP)熔体, 并利用液封直拉法(LEC)生长出了掺硫及掺铁单晶材料。分别用快速扫描光荧光谱技术(PL-Mapping)、扫描电镜和傅里叶红外光谱对富磷单晶样品进行了研究。结果表明在富磷条件下拉制的InP单晶会出现孔洞, 致使在孔洞周围及远离区域晶体结晶质量和晶格常数存在差异;对于掺杂样品,孔洞的存在会造成杂质分布的不均匀性,在孔洞周围浓度明显高于其它区域。
oped InP single crystals were grown by in-situ phosphorous injection synthesis liquid encapsulated Czochraski (LEC) method. The structural uniformity of differently doped InP wafer samples were investigated by rapid photoluminescence mapping, scanning electron microscopy and fourier transform infrared spectroscopy, respectively. The experimental results indicate that there are irregular pores existed in the P-rich LEC grown InP ingots. And this induced the inhomogeneity of the crystal quality and lattice constant. The uniformity of the dopant distribution across the wafer is in?uenced by these pores and the concentration surrounded is higher than the rest regions.
潘静、杨瑞霞、李晓岚、杨帆、陈爱华、孙聂枫、刘志国
晶体学半导体技术
微电子学与固体电子学磷化铟富磷PL-MappingFT-IR
Microelectronics and solid-state electronicsInPP-richPL-MappingFT-IR
潘静,杨瑞霞,李晓岚,杨帆,陈爱华,孙聂枫,刘志国.富磷熔体生长InP单晶的均匀性研究[EB/OL].(2013-08-02)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/201308-9.点此复制
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