o/Ni多层膜热稳定性研究
hermal stability study of Co/Ni multilayer films
本文研究了氧化物覆盖层和Pt插层对Co/Ni多层膜的热稳定性的影响。发现HfO2覆盖下的Co/Ni多层膜体系退火温度达到400℃时仍可保持较高的垂直各向异性。而引入Pt 插层可以适当增强体系垂直磁各向异性。同时发现HfO2覆盖下的Co/Ni多层膜体系退火后反常霍尔电阻率有显著提升，并在375℃时达到最高值0.846μΩ cm，与制备态0.272μΩ cm相比提高了211%。
Effects of the HfO2 caplayer and the thickness of Pt interlayer on thermal stability of perpendicular magnetic anisotropy (PMA) in Co/Ni multilayers have been studied. It is found that PMA behavior can be observed in Co/Ni multilayers with HfO2 caplayer after annealing at 400 C. PMA also can be enhanced by the Pt interlayer. The saturation anomalous Hall resistivity of the system is greatly increased, which is 0.846μΩ cm after annealing at 375 C, 211% larger than in the sample at deposited state which is only 0.272μΩ cm.
于广华、刘亦玮
材料科学金属学、热处理
o/Ni 多层膜热稳定性垂直各向异性反常霍尔效应HfO2覆盖层
o/Ni multilayerthermal stabilityperpendicular magnetic anisotropy (PMA)anomalous Hall effectHfO2 caplayer
于广华,刘亦玮.o/Ni多层膜热稳定性研究[EB/OL].(2016-01-14)[2025-08-03].http://www.paper.edu.cn/releasepaper/content/201601-290.点此复制
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