硅烷流量对电弧离子镀TiSiN 涂层结构和性能的影响
he effects of SiH4 flowrate on the microstructure and properties of TiSiN nanocomposite coatings by vacuum cathodic arc ion plating
在硅烷气氛中采用电弧离子镀技术制备TiSiN复合涂层。系统研究了硅烷流量对涂层结构和性能的影响。采用透射电子显微镜分析涂层结构,采用X射线光电子能谱分析涂层化学键合状态,采用显微硬度计和摩擦磨损仪对涂层硬度和摩擦学性能进行评价。结果表明随硅烷流量增加,TiSiN涂层结构从柱状晶变为纳米晶。当硅烷流量为42sccm时,涂层硬度达到4100HV,随后随硅烷流量增加而降低。当对磨材料为氮化硅时,涂层摩擦系数在0.6-0.7之间变化。硅烷流量对涂层具有非常显著的影响。
iSiN nanocomposite hard coatings have been deposited onto silicon and cemented carbide substrates by a vacuum cathodic arc ion plating system using high purity Ti target under SiH4 ambient. The effects of SiH4 flowrate on the microstructure, mechanical and tribological properties of the coatings were investigated systemically. Transmission electron microscopy and X-ray diffraction techniques were employed to probe the microstructure. X-ray photoelectron spectroscopy was used to investigate the chemical bonding states. Microhardness testers and tribometer were used to evaluate the mechanical and tribological properties of TiSiN nanocomposite coatings. The results showed that with increasing SiH4 flowrate, TiSiN coating structure varied from columnar grain to nanocrystalline composite coatings, where obvious TiN nanograins could be observed. The hardness of the coatings increase continuously up to 4100 HV0.025 at 42 sccm SiH4 flowrate (6.3 at.% Si content) and then decrease with further addition of SiH4 flowrate. The coefficient of friction of TiSiN composite coatings was kept at a relatively higher value in the range of 0.6-0.7 when the mating materials are Si3N4 balls. SiH4 flowrate exhibited significant influence on the microstructure and properties of TiSiN composite coatings.
阎少健、洪梦庆、王如意、刘辉东、杨兵、万强、田灿鑫、任峰、陈燕鸣
材料科学真空技术电化学工业
材料学iSiN涂层微结构力学性能摩擦学性能
Materials ScienceiSiN coatingMicrostructureMechanical properitesTribological performance
阎少健,洪梦庆,王如意,刘辉东,杨兵,万强,田灿鑫,任峰,陈燕鸣.硅烷流量对电弧离子镀TiSiN 涂层结构和性能的影响[EB/OL].(2013-11-12)[2025-08-16].http://www.paper.edu.cn/releasepaper/content/201311-216.点此复制
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