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利用各种掩膜在三组分光化学反应体系中创建多重图案

Using kinds of masks to create multiple patterns in photoreactive ternary blends

中文摘要英文摘要

具有奇特结构的多组分聚合物体系能够展现出许多新奇的物理性质从而使得其在材料工程领域中具有十分重要的潜在应用价值。本文采用元胞动力学方法研究了耦合光化学反应的三组分混合物在各种光照掩膜受限下的相行为,得到了多种不同的无缺陷有序形貌。我们首先将所研究的体系上分别覆盖各种不同形状的掩膜而后施加光照,在光照条件下,无光学活性的C组分会在光照裸露区域发生“钉扎”现象,这种钉扎结构进一步促使A、B组分在非光照区域形成了周期排列的有序结构;相分离进行一段时间后去掉掩膜,使整个体系暴露在光照下,光化学反应的发生驱动体系形成了新的有序结构。该研究结果为实验以及工程技术上制造无缺陷分级有序结构提供了一种简便的方法。

Multi-component polymer mixtures with novel structures can exhibit novel physical properties and have a variety of potential applications in materials engineering. Via cell dynamical simulations, the phase behavior of three-component, photoreactive blends under different kinds of masks confinement has been studied systematically and multiple ordered defect-free morphologies have been obtained.Firstly, the sample is irradiated by light through various shaped masks, which make the C regions pinned and thereby promotes the self-assembly of A and B components into ordered domains.When the masks are removed, the photoreaction of the AB blend leads to different periodic patterns.These results provide an easy method to create hierarchically ordered, defect-free materials in experiment and engineering technology.

潘俊星,张进军,王宝凤,武海顺,孙敏娜

材料科学物理学

聚合物计算机模拟光反应掩膜

polymer computer simulation photoreaction mask

潘俊星,张进军,王宝凤,武海顺,孙敏娜.利用各种掩膜在三组分光化学反应体系中创建多重图案[EB/OL].(2014-06-20)[2025-08-18].http://www.paper.edu.cn/releasepaper/content/201406-319.点此复制

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