铁基上电沉积Ni-Cr合金工艺研究
Study on Ni-Cr alloy electrodepositing technology on Fe substrate
本文在氯化物—硫酸盐混合体系中，研究了在铁基上电沉积Ni-Cr合金的工艺，探讨了主要工艺参数对合金镀层中成分的影响，确定出电沉积镍-铬合金的最佳电镀液组成和工艺条件： CrCl3•6H2O为75g/L，阴极电流密度为16A/dm2，镀液温度为30℃，pH值为2.5。在最佳条件下铁基上所得的Ni-Cr镀层光亮致密、与铁基的结合力好且Cr的含量可高达24.1%，镀层为晶态结构，晶粒平均尺寸为82nm。
he Ni-Cr alloy electrodepositing technology on iron substrate in the chlorid-sulfate solution and the impacts of main processing parameters on coating component were studied in this paper. The optimal Ni-Cr alloy electrodepositing conditions are that the cathode current density is 16 A/dm2，the plating solution temperature is 30℃ and the pH value is 2.5.The bright, compact coating gained under the optimal conditions has fine cohesion and 24.1% Cr content. The results show that the coating structure is crystalline, the average grain size is 82nm.
许利剑、王婷、郭雅飞、李松、冯章启、何农跃
电化学工业
电沉积Ni-Cr合金镀层成分
electrodeposit Ni-Cr alloy coating component
许利剑,王婷,郭雅飞,李松,冯章启,何农跃.铁基上电沉积Ni-Cr合金工艺研究[EB/OL].(2007-01-25)[2025-08-25].http://www.paper.edu.cn/releasepaper/content/200701-362.点此复制
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