|国家预印本平台
首页|基于PIC-MCC法的颗粒物在等离子体中荷电仿真

基于PIC-MCC法的颗粒物在等离子体中荷电仿真

harging Simulation of Particulates in Low Temperature Plasma Based on PIC-MCC Method

中文摘要英文摘要

颗粒物在低温等离子体中的荷电瞬间完成且过程复杂,所带电量的多少直接影响颗粒的运动与捕集。本文基于单元粒子法和蒙特卡罗混合法,建立仿真模型,模拟颗粒物在低温氩等离子体中的荷电特性。通过统计到达颗粒表面的电子、离子数目确定电量,并获得带电粒子的空间分布与自洽电场。研究表明:半径为15μm的颗粒在等离子体中荷电量约为78000e,颗粒表面电势约为-7.5V,且在距离表面100μm范围内迅速升至0V。在颗粒附近,离子数密度始终大于电子数密度。离子数密度在近壁处迅速增至无扰动区数密度,而电子数密度则相对较慢地增大至背景浓度。此外,颗粒的荷电量与其粒径成正比。

harging of particulates in low temperature plasma is instantaneously finished and the process is complicated. The motion and trapping of the particulates are directly determined by the charges of themselves. Here a numerical model based on Particle-in-Cell (PIC) and Monte-Carlo Collision (MCC) hybrid method was developed to study the charging characteristics of fine particles immersed in low temperature argon plasma. The net charge of a fine particulate was evaluated by counting the number of electrons and ions reached the surface of the particulate. Meanwhile, the profiles of charged particles and self-consistent electric field were obtained. For the particulate with a radius of 15 μm in the plasma, the charge is approximately 78000 e and the electric potential of the surface is about -7.5 V. Also the potential quickly increases to 0 V within 100 μm. In the vicinity of the particulate, the ion number density is always greater than that of the electron. Ion density quickly raises to the undisturbed zone density near the wall, however, the electron density relatively slowly enlarged to the background concentration. In addition, the charge of a particulate is proportional to its diameter.

钱中、杨帆

真空电子技术

等离子体颗粒物荷电PICMC

plasmaparticulateschargingPICMC

钱中,杨帆.基于PIC-MCC法的颗粒物在等离子体中荷电仿真[EB/OL].(2013-07-26)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/201307-372.点此复制

评论