基于同位素标定技术CVD石墨烯的生长机制研究
he study of CVD graphene growth mechanism based on isotope labelling technique
近年来同位素标定技术结合拉曼光谱技术已经发展成为石墨烯最有前景的表征手段之一，本文结合国内外的研究现状，综述了基于此项表征手段的化学气相沉积法石墨烯生长机制的研究成果，并对未来这项表征技术的应用前景进行了展望。
Isotope labelling technique in connection with Raman spectrum has developed as one of the most prospective charactrization methods for graphene research recently.In this review，we give a detailed introduction on the study of growth mechanism of Chemical Vapor Deposition graphene based on this method and the future development of this method is also discussed.
蔡伟伟、黎琼钰
材料科学
凝聚态物理石墨烯同位素标定拉曼光谱化学气相沉积法生长机制
ondensed matter physicsGrapheneisotope labellingRaman spectrumChemical vapor depositionGrowth mechanism
蔡伟伟,黎琼钰.基于同位素标定技术CVD石墨烯的生长机制研究[EB/OL].(2016-06-13)[2025-08-16].http://www.paper.edu.cn/releasepaper/content/201606-628.点此复制
评论