利用条形掩膜在三组分光化学反应体系中创建分级有序图案

Using cell dynamical simulation, the phase behavior of three-component, photoreactive blends under striped masks' inducing has been studied and multiple ordered defect-free morphologies have been obtained. The influence of strip width,interspace between strips,composition ratio,and the strength of light irradiation has been systematically investigated. We obtained hierarchically ordered, defect-free structures when suitable masks and composition ratio are chose, and these structures can stably exist for a long time after masks removed.This model provide an easy method to create hierarchically ordered, defect-free materials in experiment and engineering technology.