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Si, S, B掺杂单层黑磷的第一性原理计算

First-principles calculations of silicon, sulfur, boron doped black phosphorus

中文摘要英文摘要

基于密度泛函理论的Si, S, B掺杂单层黑磷的第一性原理计算,本文研究了Si, S, B掺杂对单层黑磷几何结构,稳定性,电子结构以及磁性的影响。计算结果表明,Si, S, B掺杂后,体系发生了不同程度的局部结构形变,其中Si掺杂体系形变最小,而B掺杂体系的形变最大。本征单层黑磷具有0.89 eV的直接带隙,且无磁性;而Si, S, B掺杂可以不同程度的调制其带隙,且Si, S掺杂体系分别具有0.34 μB,0.98 μB的磁矩,而B掺杂体系并没有表现出磁性。因掺杂后体系出现不同大小的磁矩,因而对单层黑磷在自旋电子器件上的应用具有指导意义。

he geometrical structures,stabilities,electronic structures and magnetic properties of Si, S, B doping monolayer black phosphorus are investigated based on the first-principles calculation of density functional theory. The results show that the geometrical deformation were occurred on Si-, S- and B-doped system, and the deformation of Si-doped system is minimized, and the deformation of B-doped system is the biggest. The intrinsic monolayer black phosphorus has a direct bandgap of 0.89 eV and with no magnetic. The doped system can modulate the band gap, and the Si and S doping systems have the magnetic moment of 0.34 μB, 0.98 μB, respectively. But the B-doped system is non-magnetic. It has great significance for black phosphorus applied in spin electronic devices because of the magnetic properties of the doped system.

雷惊雷、江城、商波

物理学晶体学半导体技术

物理化学黑磷掺杂密度泛函理论电子结构磁性

Physical chemistryBlack phosphorusDopingDensity functional theoryelectronic structureMagnetic

雷惊雷,江城,商波.Si, S, B掺杂单层黑磷的第一性原理计算[EB/OL].(2017-05-16)[2025-07-09].http://www.paper.edu.cn/releasepaper/content/201705-1028.点此复制

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