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集群磁流变效应微磨头平面研抛加工技术的研究

evelopment of a new plate polishing technique with an instantaneous tiny-grinding wheel cluster based on magnetorheological effect

中文摘要英文摘要

本文提出集群磁流变效应微磨头平面抛光新方法,进行了相应的基础研究,验证了这一平面研抛加工新技术的可行性和优越性。在一定实验条件下,材料去除率相对于传统游离磨料研磨加工提高了20.84%,而表面粗糙度仅略有提高,并优选了磁流变研抛液配比。在此基础上,提出了磁流变效应微磨头平面抛光的材料去除模型。

new plate polishing technique with an instantaneous tiny-grinding wheel cluster based on the magnetorheological (MR) effect is presented in this paper, and some experiments were conducted to prove its effectiveness and applicability. Under certain experimental condition, the material removal rate was improved by a factor of 20.84% as compared with the conventional polishing methods with dissociative abrasive particles, while the surface roughness of the workpiece was not obviously increased. Furthermore, the composite of the MR fluid was optimized to obtain the best polishing performance. On the basis of the experimental results, the material removal model of the new plate polishing technique was presented.

高伟强、路家斌、汤爱军、阎秋生

材料科学机械制造工艺电子技术应用

集群微磨头磁流变效应平面抛光材料去除模型

iny-grinding wheel clusterMagnetorheological effectPlate polishing Material removal model

高伟强,路家斌,汤爱军,阎秋生.集群磁流变效应微磨头平面研抛加工技术的研究[EB/OL].(2008-04-25)[2025-08-11].http://www.paper.edu.cn/releasepaper/content/200804-950.点此复制

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