水稻剑叶耐光氧化性QTL分析
QTL Analysis for tolerance to photooxidation of flag leaf in rice
利用Lemont和Dular杂交后代单粒传衍生的123个F9家系所组成的重组自交系（Recombinant inbred lines,RILs）群体，研究水稻剑叶的数量性状基因座（QTL）。在齐穗期测定剑叶耐光氧化的耐性指标（T）和敏感性指标（S）。采用复合区间作图法对2个性状进行定位分析，结果表明，在RIL群体中，2个性状呈连续分布，受微效多基因控制，并且各性状均存在一定数量的超亲遗传类型。2个性状共检测到11个QTL，各QTL的LOD值为2.02-5.07，贡献率为6%-23%。其中在第1、2、3、6、8染色体上检测到控制耐性指标的7个QTLs，贡献率为6%-19%;在第1、3、5、8染色体上检测到控制敏感性指标的4个QTLs，贡献率分别为19%、23%、6%和7%；分别在第3、8染色体的相同区间内(RM85-RM468和RM408-RM250)检测到2个性状的QTLs,这很好的解释了2性状之间存在着极显著负相关性。
mapping population of 123 F9 lines(recombinant inbred lines,RILs),derived from a cross between Javanica variety Lemont and India variety Dular.The QTL analysis was conducted for tolerance to photooxidation of flag leaf,including Tolerance index(T) and Sensibility index(S).A total of eleven putative QTLs were detected with percentage of variance explained(PVE)ranging between 6%-23%, and LOD of QTLs 2.02-5.07.Of those putative QTLs,seven for Tolerance index detected on chromosomes 1,2,3,6 and 8，with PVE ranging between 6%-19%;four controlling Sensibility index on chromosomes1,3,5 and 8,PVE of 19%,23%,6% and 7%.Considering both traits,Two QTLs for Tolerance index and Sensibility index were colocalized around RM468 and RM408 respectively,which could explain negatively significant correlation between Tolerance index and Sensibility index.
林文雄、江宝月、贾小丽、邓家耀
农作物遗传学植物学
水稻耐光氧化数量性状基因座（QTL）耐性指标敏感性指标
ricequantitative trait loci(QTL)tolerance to photooxidationTolerance index(T)Sensibility index(S)
林文雄,江宝月,贾小丽,邓家耀.水稻剑叶耐光氧化性QTL分析[EB/OL].(2008-03-05)[2025-08-21].http://www.paper.edu.cn/releasepaper/content/200803-99.点此复制
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