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首页|He离子注入对Cu/Cr和Cu/Nb纳米金属多层膜力学性能的影响

He离子注入对Cu/Cr和Cu/Nb纳米金属多层膜力学性能的影响

he effect of He ion implantation on the mechanical properties of Cu/Cr and Cu/Nb multilayers

中文摘要英文摘要

u/Nb, Cu/Cr纳米金属多层膜具有多界面性和良好的力学性能,能够有效的阻挡入射的辐照离子,并在辐照后保持良好的力学性能。本文中,我们用5×1016cm-2,40keVHe+注入调制周期为5nm-250nm两种铜系纳米金属多层膜,发现:随着两种薄膜调制周期减小1.注入离子的射程逐渐减小;2.注入形成的He Bubbles尺寸逐渐增大;3.注入前后两种薄膜的硬度值逐渐增加,并且注入导致的硬度增加值逐渐减小。我们通过多层膜界面能量随调制周期变化的规律,解释了发生上述变化的原因。

u/Nb and Cu/Cr nanostructured multilayers have multi-interface and good mechanical properties. It is possible for them to effectively block incident ions and maintain good mechanical properties after irradiation. In this article, we use 5×1016cm-2,40keVHe+to implant Cu/Nb and Cu/Cr multilayers,which have a modulation period of 5nm to 250nm.We find that with the decrease of the modulation period gradually 1.the range of implanted He ions gradually decrease;2.the size of He bubbles formed by irradiatoin gradually increases;3.the hardness of the two kind of films before and after He ions implantation decreases and the increased hardness induced by irradiation deceases.We have explained the reasons for the occurance of the above phenomena by using the rules that the interface energy of multilayers changes with the modulation period.

牛佳佳、朱望波、孙军、梁晓晴、刘刚

材料科学金属学、热处理

纳米金属多层膜硬度辐照界面能量He bubbles

Nanostuctured multilayersHardnessIrradiationInterface energyHe bubbles

牛佳佳,朱望波,孙军,梁晓晴,刘刚.He离子注入对Cu/Cr和Cu/Nb纳米金属多层膜力学性能的影响[EB/OL].(2014-01-10)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/201401-504.点此复制

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