黑硅发展现状及其制备方法综述

Black silicon is a special microstructure prepared on the surface of a silicon wafer. It has light-trapping properties, which can make the light reflected back after being incident on the silicon surface re-enter the silicon material to achieve the effect of reducing reflection loss. Black silicon is widely used to enhance the absorption of silicon photodetectors in their response wavelength bands. For different types of black silicon structures prepared by different methods, the anti-reflective properties can be improved to varying degrees. A good black silicon structure can achieve multiple reflections and incidences of light, thus increasing the anti-reflection rate to over 90%. This article mainly summarizes the research work of many researchers on black silicon since the first discovery of black silicon by Eric Mazur\'s team in 1998, and introduces in detail the production mechanism and preparation methods of different types of black silicon.