o掺杂及空位缺陷对石墨烯-铜复合材料界面结合影响的第一性原理研究
he first principle study of the effect of Co doping and vacancy defect on the interfacial bonding of graphene-copper composites
本文通过第一性原理计算,研究了替位式掺杂元素Co及C/Cu空位缺陷对石墨烯-铜(Gr-Cu)界面结合性能的的影响。研究结果表明,理想Gr-Cu界面的结合能为-0.089eV,界面的键合作用不强。Co原子代替一个Cu原子掺杂时,界面结合能为-0.43eV。表明Co原子掺杂增进了Cr-Cu界面之间的相互作用,改进了Cr-Cu界面结合性能。对于含有C/Cu空位缺陷的Gr-Cu界面而言,Co掺杂也能改善其界面结合状态,只是该界面结合的难易度和稳定性均低于Co掺杂的理想界面。因此,在制备Co掺杂Gr-Cu复合材料的过程中,应尽可能避免C/Cu空位缺陷的存在。我们的研究结果为相关实验研究提供了有益的理论指导。
By first principles calculations, we study the effect of the substitutional impurity Co and C/Cu vacancy defect on the interfacial bonding between copper and graphene. The results show that the bonding energy between graphene and Cu is -0.089eV, which implies the weak bonding of the Gr-Cu interface. The bonding energy is -0.43eV when one Cu atom is displaced with Co atom. It shows that Co incorporation can improve the interfacial bonding. For the Gr-Cu interface with C/Cu vacancy defect, Co impurity also improves the interfacial bonding, which is lower than the Gr-Cu interface without C/Cu vacancy defect. Therefore, it is necessary to avoid the forming of C/Cu vacancy defect during preparing the Gr-Cu composite doped by Co. The results provide useful theoretical guidance for the related experimental work.
朱恩福、闫翠霞、邓爱林
材料科学物理学
第一性原理u/C界面o掺杂
first principlesGr-Cu interfaceCo-doped
朱恩福,闫翠霞,邓爱林.o掺杂及空位缺陷对石墨烯-铜复合材料界面结合影响的第一性原理研究[EB/OL].(2016-07-04)[2025-08-22].http://www.paper.edu.cn/releasepaper/content/201607-20.点此复制
评论