绒面ZnO透明导电薄膜
extured ZnO transparent conductive thin film
采用孪生ZnO (Al2O3:2%)对靶直流磁控溅射制备高透过率、高电导率的平面ZnO薄膜（迁移率为5.56 cm2/V•s，载流子浓度为4.57×1020cm-3，电阻率为2.46×10－3ohm•cm ，可见光范围(380~800nm)平均透过率大于85％）。用酸腐蚀的方法，可以获得绒面效果，而反应气压对绒面效果没有影响，薄膜的电学特性没有变化，绒面对光散射作用增强，导致相对于平面ZnO薄膜的透过率要低一些（可见光范围平均透过率大于80％）。
he smooth ZnO film with high conductivity and high transmission was deposited on glass substrates by reactive DC. magnet sputtering with twin targets of ZnO(Al2O3:2%),( 5.56 cm2/V•s，N=4.57×1020cm-3，ρ=2.46×10－3ohm•cm ，visible light (380~800nm) transmission＞85％). The textured ZnO was gained by post-deposition chemical etching, whose texture was not effected by the reaction pressure, and whose conductivity was not effected. The transmission of textured ZnO was lower than smooth ZnO (visible light transmission＞85％), because the diffraction of textured ZnO was increased.
朱锋、耿新华、赵颖、薛玉明、孙建
电工材料半导体技术光电子技术
孪生对靶，直流磁控溅射，ZnO，透明导电薄膜，绒面
twin targets reactive DC. magnet sputtering ZnO transparent conductive film textured film
朱锋,耿新华,赵颖,薛玉明,孙建.绒面ZnO透明导电薄膜[EB/OL].(2004-02-09)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/200402-25.点此复制
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