磁控溅射制备高熵合金非晶薄膜
morphous film of high entropy alloy deposited by direct current magnetron sputtering
采用磁控溅射在Ar和O2气氛下制备了AlFeCoNiCuZrV多组元合金非晶薄膜。结果表明非晶薄膜的成分、组织和力学性能取决于氧的浓度。当氧浓度比在0-50%时,随氧浓度比增加,薄膜的厚度减少,而薄膜表面粗糙度开始减低随后增加。 O2 浓度为30%时,制备出致密且平滑的非晶薄膜。薄膜的硬度和杨氏模量分别达12GPa和 166 GPa。
In this paper, The amorphous films of AlFeCoNiCuZrV multicomponent high-entropy alloy were deposited by direct current magnetron sputtering in the mixture atmosphere of Ar and O2. The results demonstrate that the chemical composition, microstructure, and mechanical properties of the amorphous films intimately rely on the concentration of O2 in the atmosphere mixture. When O2 flow ratio increases from 0 to 50%, the thickness of the films decreases, whereas the roughness firstly decreases and then increases. At the O2 flow ratio of 30%, a perfect dense and smooth amorphous nitride film could be achieved. While the hardness and Young's modulus of the film reach the maximum values of 12 and 166 GPa, respectively.
朱建波、李建忱
冶金技术金属学、热处理
高熵合金非晶薄膜性能磁控溅射
High entropy alloyamorphous filmpropertiesmagnetron sputtering
朱建波,李建忱.磁控溅射制备高熵合金非晶薄膜[EB/OL].(2013-12-24)[2025-08-16].http://www.paper.edu.cn/releasepaper/content/201312-793.点此复制
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