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交替磁控溅射法制备SiC/ZnO纳米颗粒的微观结构及发光机理研究

Luminescence and microstructural characteristics of SiC/ZnO nanocomposites prepared by radio frequency alternate sputtering

中文摘要英文摘要

本文采用了交替磁控溅射以及在N2保护下退火成功制备了SiC/ZnO纳米颗粒膜,实验结果表明:退火温度对SiC/ZnO纳米颗粒膜的微观结构和发光性能有很大影响,SiC层在600℃退火时团聚形成SiC纳米团簇分布在ZnO基体中,当退火温度为900℃时,部分SiC纳米团簇形成SiC纳米晶体,根据FTIR分析,在退火过程中SiC表面会被氧化形成SiOx (x<2)或 SiO2;用211nm波长光激发薄膜表面,在381nm (3.3ev)处有较强的紫光发射,在465nm (2.7ev) 和560nm (2.3ev)处分别有较强的蓝光发射和较弱的绿光发射,发光强度随温度的升高而增强,紫光发射归结为ZnO的自由激子跃迁,蓝光与绿光发射归结为退火薄膜与Si-O相关的缺陷形成的发光中心。

SiC/ZnO nanocomposites have been successfully prepared by radio frequency alternate sputtering and annealed at N2 ambient. The result shows that the Luminescence and microstructural characteristics of SiC/ZnO nanocomposites have a great relation with the annealing temperature, the SiC thin layer aggregated to form SiC nanoclusters when the annealing temperature is 600℃. When the annealing temperature increased above 900℃, some of the SiC nanoclusters begun to change into β-SiC nanocrystals, the β-SiC nanocrystals were surrounded by a layer of SiOx (x<2) or SiO2 according to the FTIR spectrum. Films annealed at 750℃ exhibited strong UV PL band at around 381nm, blue-emission band at around 465nm and weak green-emission band at around 560nm. UV light originated from the near band edge (NBE) emission of ZnO; blue-emission band at around 465nm and green-emission band at around 560nm might due to the emission-center caused by the defect states of Si-O bands.

杜希文、师春生、郑越、赵乃勤

物理学晶体学

SiC纳米颗粒膜,退火,微观结构,光致发光

SiC/ZnO nanocompositesannealingmicrostructurephotoluminescence

杜希文,师春生,郑越,赵乃勤.交替磁控溅射法制备SiC/ZnO纳米颗粒的微观结构及发光机理研究[EB/OL].(2007-04-19)[2025-08-28].http://www.paper.edu.cn/releasepaper/content/200704-484.点此复制

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