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ZnO薄膜晶体管的制备及电学特性表征

he fabrication of ZnO TFT and characterization of the electric property

中文摘要英文摘要

ZnO薄膜作为宽禁带的半导体材料,其迁移率较高,在可见光区具有高透射率,低的光灵敏度,使其适于制备ZnO薄膜晶体管,并在平面显示方面有广泛的应用前景。本文介绍了ZnO薄膜晶体管的制作过程,并对其电学特性进行了表征,其结果显示以ZnO薄膜作为薄膜晶体管的有缘层,以SiO2作为栅绝缘层所制备的ZnO薄膜晶体管,在栅上加正偏压对ZnO薄膜的导电性有很好的控制作用。此文的内容是我们对ZnO薄膜晶体管研究的基础,有利于我们进一步对ZnO薄膜晶体管的特性及制备工艺对特性影响进行研究。

ZnO thin film is a wide band gap semiconductor material with high mobility, high transparency in the visible region of the spectrum and less light sensitive which are favorable for ZnO thin film transistor(TFT) apllication. ZnO TFT will have the widespread application prospects. In this paper, we introduced the processing of making ZnO TFT and characterised the electronic property. The results show the ZnO TFT with the ZnO as the active film, with SiO2 as the gate dielectric, had good gate voltage control property. The study of this paper is the foundation of ZnO TET investigation. It is benefit to study the properties of ZnO TFT and the affection of the proceeding conditions to the properties of ZnO TFT.

陈希、胡礼中、张贺秋

半导体技术微电子学、集成电路

ZnO透明薄膜晶体管

ZnOtransparencythin film transistor

陈希,胡礼中,张贺秋.ZnO薄膜晶体管的制备及电学特性表征[EB/OL].(2009-07-01)[2025-07-17].http://www.paper.edu.cn/releasepaper/content/200907-16.点此复制

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