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退火对InP / ZnS量子点薄膜光学性质的影响

Effect of Post Thermal Annealing on the Optical Properties of InP/ZnS Quantum Dots Films

中文摘要英文摘要

本文通过热退火技术提高了InP/ZnS核壳量子点薄膜光学性能。在180℃下退火5分钟后,量子点薄膜的发光增强。通过变温和变激发光致发光(PL)光谱测试,证实位于低能端发光峰来源于局域态发光,高能端来自自由激子发光。从180℃退火5min的样品的变温光致发光光谱看,局域态发光半高宽在250K之前几乎相同,随后随着温度的升高而降低。然而,未退火处理的样品中半高宽随着温度升高而一直降低。我们采用随温度升高,局域态载流子的热逃逸模型分析了这些变化,并推导出退火对其能带结构造成的改变。我们的研究对量子点在电致发光或下转换发光领域具有一定意义。

he enhancement of optical properties via thermal annealing on InP/ZnS core/shell quantum dots (QDs) film was investigated in this work. The increase of emission intensities of the QDs films was observed after thermal annealing at 180 ℃ for 5 minutes. Through temperature dependence photoluminescence (TDPL) and power dependence photoluminescence (PL) measurement, the peak located at the low-energy shoulder was confirmed to be localized states emission and the high energy one comes from free-carrier emission. Moreover, from the TDPL spectra of the sample anneal at 180 ℃ for 5 minutes, the full width at half maximum (FWHM) of localization states emission was nearly the same before 250 K, and then decreased with increasing temperature. However, the FWHM was decreased significantly with temperature increased in the untreated sample. We conclude that the escape of localization states with increasing temperature contributes to this anomaly phenomenon. Our studies have significance on the application of QDs in electroluminescence or down-conversion light-emitting applications.

王登魁、张博文、陈锐、王新伟、魏志鹏、房丹、方铉、王晓华、高娴

物理学光电子技术半导体技术

InP/ZnS 量子点薄膜热退火光学性质

InP/ZnS QDs filmThermal annealingOptical properties

王登魁,张博文,陈锐,王新伟,魏志鹏,房丹,方铉,王晓华,高娴.退火对InP / ZnS量子点薄膜光学性质的影响[EB/OL].(2018-01-30)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/201801-201.点此复制

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