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GaAs衬底-纳米线型pn结电学特性的理论分析

nalysis of Electrical Properties of GaAs Substrate-Nanowire P-N Junction

中文摘要英文摘要

本文从理论上研究了GaAs衬底-纳米线型pn结的电学特性。结果显示,GaAs衬底-纳米线型pn结表现出明显的二极管特性,与已有的实验数据相吻合。进一步的研究表明,纳米线的平均生长密度、纳米线的平均直径和纳米线的掺杂浓度对衬底-纳米线型pn结的暗电流和开启电压影响不大,但是对开启之后的电流有影响。增大纳米线的平均生长密度,纳米线平均直径和纳米线的掺杂浓度均会导致通过衬底-纳米线型pn结的电流增大。这些结论可以指导纳米尺寸器件的设计和集成。

We theoretically analyze the electrical properties of GaAs substrate-nanowire p-n junction. The results show that GaAs nanowire-substrate p-n junction exhibits clear diode behavior which has been confirmed in some experiments. Increasing NWs doping concentration and diameter can enlarge the total current after the diode is conducted. These results constitute an important progress for experimental researches on nanowire-integrated devices.

张霞、颜鑫、李军帅、陈文丽

半导体技术

纳米线pn结电学特性GaAs

nanowirepn junctionelectrical propertyGaAs

张霞,颜鑫,李军帅,陈文丽.GaAs衬底-纳米线型pn结电学特性的理论分析[EB/OL].(2013-01-02)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/201301-3.点此复制

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