一种有效去除化学机械抛光后残留有机物的新方法
Method of wiping off residue organic matter in Post–CMP cleaning
本文提出了硅片化学机械抛光后表面残留的有机物污染,介绍了金刚石膜电化学合成过氧化物的方法,原理。根据有机物易被氧化分解的特性,采用金刚石膜电化学法合成的过氧化物,利用过氧化物的氧化性氧化分解硅片化学机械抛光后表面的有机物残留配合特选的表面活性剂,并加超声清洗,物理化学方法结合,从而达到去除有机物污染的目的。实验表明,利用金刚石膜电化学法合成的过氧化物配合特选的表面活性剂作为清洗试剂,加超声进行清洗,能够有效去除硅片化学机械抛光后表面的有机物残留,达到较好的清洗效果。
Residue organic matter pollution is introduced in Post-CMP. The theory of the oxidability of peroxide synthesized by the BDD anodes used in the electrochemical is introduced. According to the characteristic of organic matter liable to being oxygenated and decomposed, using the oxidability of peroxide synthesized by the BDD anodes used in the electrochemical to oxygenolysis residue organic matter and coordinate with ultrasonic cleaning, combine physical with chemical method thus achieve the goal wiping off residue organic matter. The experiments show peroxide adding to selecting surface active agent as cleaning agent, plus ultrasonic cleaning, so as to wipe off residue organic matter effectively in Post-CMP and complete the better effects of cleaning.
刘效岩、康海燕、苏艳勤、刘玉岭、武彩霞
电化学工业有机化学工业精细化学工业
电化学合成表面活性剂有机物过氧化物超声清洗
electrochemical synthesissurface active agentorganic matterperoxideultrasonic cleaning
刘效岩,康海燕,苏艳勤,刘玉岭,武彩霞.一种有效去除化学机械抛光后残留有机物的新方法[EB/OL].(2009-08-05)[2025-08-23].http://www.paper.edu.cn/releasepaper/content/200908-84.点此复制
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