直流诱导的高功率脉冲非平衡磁控溅射

his paper reported the phenomenon and mechanism of the direct current-induced high power pulse unbalanced magnetron sputtering. The high power pulse discharge of large amplitude and low frequency may be formed via controlling the discharge parameters such as the pressure, power and coil current etc. The study of the relation between the high power pulse discharge properties and the discharge parameters such as coil current, pressure and power etc was carried out. The analysis on the characteristics, mechanism and influential factors of pulse waveform was carried out, and based on the qualitative theory of magnetically insulated diode, the values including pulsed ion current and electron current and the like are calculated, which are conformed to the test results.