MgO/Mg/MgO多层结构深紫外透明导电薄膜的制备
MgO/Mg/MgO multilayer structure of deep ultraviolet transparent conductive thin film
本文采用射频磁控溅射方法，以高纯Mg为靶材，以高纯氩气、氧气为溅射气体，在蓝宝石衬底上制备了MgO/Mg/MgO多层结构深紫外透明导电薄膜。利用X射线衍射仪、紫外-可见分光光度计、霍尔测试仪等测试手段，对单一Mg和MgO层的光学和电学特性进行了表征与分析。在此基础之上，优化了Mg和MgO层的厚度，制备出了具有优良光电特性的多层结构深紫外透明导电薄膜。当Mg层厚度为5nm，MgO层厚度为40nm时，MgO/Mg/MgO多层结构的方块电阻为57.35Ω/□，在200~300nm波长范围内的透射率大于85%。
In this paper, MgO/Mg/MgO multilayer structure was fabricated on the sapphire substrate using high pure Mg target, high purity of argon and oxygen sputtering gas via RF magnetron sputtering. The optical and electrical properties of single Mg layer and MgO layer were characterized and analyzed by X-ray diffraction, optical transmittance spectra and Hall effect measurement. Furthermore, the thickness of Mg and MgO layer were optimized and a deep ultraviolet transparent conductive thin film with excellent photoelectric characteristics was fabricated. When the thickness of Mg and MgO layers were 5nm and 40nm, the sheet resistance of MgO/Mg/MgO multilayer structure was 57.35ohm/sq with transmittance above 85% at the wavelength range of 200~300nm.
夏晓川、杜国同、申人升、徐梦想、柳阳、陈远鹏、梁红伟、颜彦
电工材料半导体技术光电子技术
深紫外透明导电Mg膜氧化镁射频磁控溅射
deep ultraviolet transparent conductiveMg filmMgORF magnetron sputtering
夏晓川,杜国同,申人升,徐梦想,柳阳,陈远鹏,梁红伟,颜彦.MgO/Mg/MgO多层结构深紫外透明导电薄膜的制备[EB/OL].(2015-04-30)[2025-08-06].http://www.paper.edu.cn/releasepaper/content/201504-469.点此复制
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