单晶硅生长过程中热场与凝固界面形状的对比研究
Comparison Investigation of the Thermal Field and Melt-Crystal Interface Shape in a CZ-Si Crystal Growth
针对实际工业生产用大口径单晶硅结晶炉热场进行了理论建模,建立了全局传热、流动模型,对不同长晶阶段单晶硅提拉炉内的温度、流动和固液凝固界面形状进行了模拟分析。研究结果表明,随着晶体生长的进行,晶棒对结晶炉内热场的影响增大,固液凝固界面变得平坦,V/G值(提拉速率与生长界面温度梯度之比)基本维持稳定。
Global simulations of heat transfer in an industrial CZ-Si crystal growth furnace are carried out. The effects of solid conduction, melt convection, thermal radiation, as well as phase change at the crystal-melt interface are taken into account. During the crystal growth, the effect of crystal rod on heat transfer in the furnace and melt-crystal interface shape becomes stronger. With the Si crystal growing, the melt-crystal interface becomes flatter. The value of V/G (the ratio between the crystal pulling rate and the temperature gradient in the crystal at the melt-crystal interface) keeps basically stable.
周俊安、耿阿楠、刘立军、赵文翰、王晓茜
材料科学工程基础科学
提拉法单晶硅数值模拟固液凝固界面
zochralski methodMonocrystalline siliconNumerical SimulationCrystal-melt interface
周俊安,耿阿楠,刘立军,赵文翰,王晓茜.单晶硅生长过程中热场与凝固界面形状的对比研究[EB/OL].(2013-07-19)[2025-08-23].http://www.paper.edu.cn/releasepaper/content/201307-302.点此复制
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