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纳米结构Ni-TiN复合薄膜的电沉积及其腐蚀行为

Electrodeposition and Corrosion Behavior of Nanostructured Ni-TiN Composite Films

中文摘要英文摘要

采用电沉积方法在黄铜基底上制备了纳米结构的Ni-TiN复合薄膜。用扫描电镜(SEM)及透射电镜(TEM)对其微观结构进行了表征,利用X射线衍射(XRD)分析了其平均晶粒尺寸,继而采用极化曲线及电化学阻抗谱(EIS)研究了其腐蚀行为。结果表明,电沉积时的电流密度、TiN纳米粒子浓度、搅拌速度、溶液温度及pH值对电沉积薄膜形貌有很大影响。制备的Ni-TiNi电沉积薄膜平均晶粒尺寸约50nm。而且,纳米结构Ni-TiNi电沉积薄膜的耐腐蚀性能远优于纯Ni沉积薄膜。

he Ni-TiN nanocomposite film was successfully electrodeposited on brass copper substrates. The microstructures of the Ni-TiN nanocomposite film were investigated using scanning electron microscopy (SEM) and transmission electron microscopy (TEM). Its average grain size was analyzed through X-ray diffraction (XRD), and its anti-corrosion property was studied through potentiodynamic scanning curves and Electrochemical Impedance Spectroscopy (EIS). The results show that the morphology of Ni-TiN composite film is sensitively dependent on the electroplating current density, TiN nanoparticle concentration, solution stirring speed, bath temperature and solution pH value. The average grain size of the optimized nanocomposite film is about 50 nm. Meanwhile, the Ni-TiN nanocomposite films are much more resistant to corrosion than pure Ni coatings.

郑国渠、蔡超、李劲风、张昭、曹发和、朱旭蓓

电工材料金属学、热处理

Ni-TiN纳米复合薄膜微观组织电沉积电化学阻抗谱

Ni-TiN nanocomposite filmmicrostructreEletrodepositionElectrochemical Impedance Spectroscopy

郑国渠,蔡超,李劲风,张昭,曹发和,朱旭蓓.纳米结构Ni-TiN复合薄膜的电沉积及其腐蚀行为[EB/OL].(2011-06-09)[2025-05-03].http://www.paper.edu.cn/releasepaper/content/201106-180.点此复制

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