间隙可调胶体晶体单层制备技术

In this paper, polystyrene (PS) monolayer colloidal crystal (MCC) with tunable interstice size is prepared by a combination of self-assembly of PS nanospheres at the air-water interface and chemical vapor deposition of silica. Water vapor around the MCC reacts with the silicon tetrachloride steam introduced by nitrogen carrier gas to form silica. Consequently, it induces the formation of a continuous silica layer coating on the surface of each PS sphere, which results in the shrinkage of the interstice between neighboring PS spheres. The method provides a facile approach to the fabrication of interstice-size-tunable, high-quality colloidal masks for nanosphere lithography application.