大面积表面等离子激元干涉光刻

Large-area surface-plasmon polariton (SPP) interference lithography is presented that uses an attenuated total reflection-coupling mode to excite the interference of the SPPs. The interference of the SPPs causes a highly directional intensity range in a finite depth of the electric field, which is good for noncontact. Finitedifference time-domain simulations of the interference on a thin resist layer show that broad-beam illumination with a p-polarized light at a wavelength of 441 nm can produce features as small as 60 nm with high contrast, smaller than 冘/7. Our results illustrate the potential for patterning periodic structures over large areas at low cost.