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缓冲层退火对氧化锌薄膜结晶性质的影响

Effect of Annealing of Buffer Layer on the Crystallization Properties of ZnO Films

中文摘要英文摘要

利用金属有机物化学气相沉积技术在蓝宝石衬底上先制备一薄层氧化锌,而后将其在不同温度的氮气氛围下进行退火处理来制备氧化锌缓冲层。在不同温度退火的缓冲层上生长氧化锌薄膜。利用X射线衍射仪、扫描电子显微镜、霍尔测试仪等表征与分析设备,研究了不同退火温度下的缓冲层对二次生长的氧化锌薄膜的晶体性质的影响,发现相比于直接在c面蓝宝石生长的氧化锌薄膜,采用优化的缓冲层能够大幅提高氧化锌薄膜的晶体质量。

In this paper, ZnO buffer layer were deposited on c-axis sapphire substrates by Metal-organic chemical vapor deposition and then,annealing in the nitrogen atmosphere under different temperature. ZnO thin films were grown on nuclear layer with different annealing temperature. Effect of buffer layer with different annealing temperature on the crystallization properties of ZnO films in the secondary growth process was studied by characterization and analysis equipments which included X-ray diffraction, scanning electron microscopy and Hall tester. Comparing with depositing ZnO film on c-axis sapphire substrates directly, the result showed that the crystal quality of ZnO film had been improved significantly by optimized nucleating layer.

梁红伟、申人升、张赫之、刘远达、杨德超、杨建增、夏晓川、杜国同

晶体学材料科学

氧化锌退火缓冲层金属有机物化学气相沉积

ZnOAnnealingBuffer LayerMOCVD

梁红伟,申人升,张赫之,刘远达,杨德超,杨建增,夏晓川,杜国同.缓冲层退火对氧化锌薄膜结晶性质的影响[EB/OL].(2013-04-24)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/201304-496.点此复制

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