基于石墨烯超棱镜的缩小成像纳米光刻技术

o achieve high resolution patterns at the imaging plane of super-lens, we developed a far-field optical lithography system. Firstly, the transformation optics method was employed for designing the demagnification super-lens system. Secondly, we proposed a novel nanolithography model with super-lens-photoresist-graphene layer structure to enhance the evanescent wave of electric field intensity distribution delivered by the transversal magnetic polarization wave. We use finite element method to analyze performance of the super-lens combining with multilayer structure and graphene back reflector. Numerical simulations indicate the lithographic resolution can reach to 50 nm, demonstrating the ability of nanolithography by this method.