Ⅵ/Ⅲ族源输入摩尔比对氧化镓薄膜结晶质量和光学特性的影响

In this paper, gallium oxide films with different Ⅵ/Ⅲ ratios were deposited on c-plane sapphire substrates by metal-organic chmeical vapor deposition. Triethylgallium and high-purity oxygen were used as the precursors of gallium and oxygen, respectively. Effect of Ⅵ/Ⅲ ratio on crystalline and optical properties of gallium oxide films was characterized by Filmetrics system, X-ray diffraction and double-beam UV-VIS-NIR spectrophotometer. The measured results of film thickness and X-ray diffraction showed that the growth rate and crystalline properties of gallium oxide films were improved with decreasing Ⅵ/Ⅲ ratios. The average transmittance of the gallium oxide films with a Ⅵ/Ⅲ ratio of 28000 in the visible wavelength range was over 85% and the calculated optical band gap was about 4.85 eV.