退火温度对原子层沉积法制备ZnMgO薄膜结构和光学性质的影响
Effects of Annealing Temperature on the Structure and Optical Properties of ZnMgO Films Prepared by Atom Layer Deposition
采用原子层沉积法（ALD）在石英衬底上制备ZnMgO薄膜，并对制得的样品在空气中进行不同温度的退火处理。利用X射线多晶衍射仪(XRD)、光致发光谱（PL）和紫外可见（UV-vis）吸收光谱对样品的晶体结构、光学性质进行表征分析。结果表明退火温度为600℃时，薄膜的晶体质量得到改善，且能明显促进薄膜中Mg组分的增加使薄膜的禁带宽度变大。从而说明适当温度的退火处理可有效的改善ZnMgO薄膜的晶体质量及光学特性。
ZnMgO films were prepared on quartz substrates by atom layer deposition (ALD) and then some of the samples were treated in air ambient at different annealing temperature. The crystal structure and optical properties of ZnMgO thin films were characterized by X-ray diffraction (XRD), photoluminescence (PL) and ultraviolet- visible（UV-vis）absorption spectra. The results showed that annealing at 600℃ could significantly improved the crystallinity of ZnMgO films，and can strongly promote the Mg content increasing in ZnMgO films in order to increase the band gap of films. So the results illustrate suitable annealing temperature can effectively improve the crystal quality and optical properties of ZnMgO films.
方芳、李金华、孙冬晓、王晓华、方铉、魏志鹏、楚学影、陈新影
物理学晶体学材料科学
原子层沉积ZnMgO薄膜退火温度
LDZnMgO filmsannealed temperature
方芳,李金华,孙冬晓,王晓华,方铉,魏志鹏,楚学影,陈新影.退火温度对原子层沉积法制备ZnMgO薄膜结构和光学性质的影响[EB/OL].(2013-09-13)[2025-08-11].http://www.paper.edu.cn/releasepaper/content/201309-194.点此复制
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