|国家预印本平台
首页|热处理温度对Pd掺杂SnO2薄膜的微结构和H2气敏特性的影响

热处理温度对Pd掺杂SnO2薄膜的微结构和H2气敏特性的影响

Influence of annealing temperature on microstructure and H2 sensing properties of Pd-doped SnO2 thin films

中文摘要英文摘要

本文考察了热处理温度对Pd掺杂SnO2溅射薄膜的微结构和H2气敏特性的影响。研究结果表明,沉积后的非晶态薄膜在热处理温度高于350℃以上转变为四方相SnO2晶体结构,形成的薄膜由柱状颗粒所组成;结晶粒度和颗粒尺寸均随着热处理温度的升高而增加。气敏特性研究结果表明,由这些薄膜制备而成的气体传感器在工作温度100℃时获得对1000 ppm H2的灵敏度峰值,且具有优良的反应/恢复可逆性;在450℃热处理温度条件下处理的Pd掺杂SnO2薄膜展现出对H2的最大灵敏度,其气敏特性的改善主要归咎于柱状颗粒形成的多孔化纳米结构及掺杂Pd的催化活性。

he influence of annealing temperature on the microstructure and H2 sensing properties of Pd-doped SnO2 sputtered thin films were investigated. The as-deposited film was amorphous and would crystallize to tetragonal SnO2 structure when the annealing temperature was above 350 C. The films were composed of columnar grains. Both crystallite size and grain size increased with an increase in annealing temperature. H2 sensing measurements showed that gas sensors based on these films obtained the peak response to 1000 ppm H2 at an operating temperature of 100 C and showed a good reversibility. The Pd-doped SnO2 thin film annealed at 450 C showed the highest response to H2. The improved gas sensing properties were attributed to the porosity of columnar nanostructures and catalytic activities of Pd doping.

刘文刚、韩聪、沈岩柏、高淑玲、崔宝玉、魏德洲、范安锋

半导体技术材料科学物理学

传感器SnO2薄膜热处理氢气气体传感器

SensorSnO2 thin filmPalladiumAnnealingHydrogenGas sensor

刘文刚,韩聪,沈岩柏,高淑玲,崔宝玉,魏德洲,范安锋.热处理温度对Pd掺杂SnO2薄膜的微结构和H2气敏特性的影响[EB/OL].(2015-01-30)[2025-08-19].http://www.paper.edu.cn/releasepaper/content/201501-513.点此复制

评论