宏孔硅光电化学腐蚀光谱响应曲线测量

he application fields of macroporous Si has increased considerably, for example, photonic crystals, Si microchannel plates, MEMS devices and so on. The spectral response characteristics of photo-electrochemical etching (PEC) of macroporous Si were researched, and the measurement experiments were designed. The spectral response curves of n-type silicon wafer was presented in aqueous HF. The halogen lamp and a center wavelength of 850nm LED array were used as the light source, then the current-voltage curves of photo-electrochemical etching of silicon were measured in aqueous HF using back-side illumination. The experimental results were analyzed theoretically in detail.