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单晶硅绒面减反结构制备技术研究

Study on the Preparation Technology of Monocrystalline Silicon Antireflection Surface

中文摘要英文摘要

太阳能电池生产工艺中,表面陷光结构是至关重要,主要目的是降低太阳光的反射率,提高对光的吸收从而提高光电效率。为了获得理想的绒面结构,本文应用化学腐蚀法,研究了异丙醇浓度,腐蚀温度和腐蚀时间对绒面形貌的影响,采用SEM对反应后样品的表面进行观察,对实验结果进行对比分析。结果表明硅片在2wt%NaOH和12wt%IPA混合液中,在80℃下腐蚀50min得到尺寸小,分布均匀,形貌理想的绒面结构。

In the technology of solar cell production , the surface structure is critical,the main purpose is to reduce the reflectance of sunlight, thereby improving the light absorption to improve photoelectric efficiency. The paper using chemical etching to get the ideal textured structure.The isopropanol concentration, temperature and corrosion time effecting on the morphology of suede were researched, using SEM for surface samples were observed after the reaction, and we have done the comparative analysis on experimental results .The results show that silicon in 2wt% NaOH and 12wt% IPA mixture, at 80℃,corrosion 50min,we can get a small size, distribution, morphology ideal textured structure.

王国政、郝子恒、端木庆铎、杨继凯

能源动力工业经济材料科学

单晶硅陷光结构化学腐蚀反射

crystalline siliconlight-trapping structurechemical etchingreflect

王国政,郝子恒,端木庆铎,杨继凯.单晶硅绒面减反结构制备技术研究[EB/OL].(2015-08-05)[2025-08-23].http://www.paper.edu.cn/releasepaper/content/201508-14.点此复制

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