退火温度对VOx薄膜的结构、形貌和电化学性能的影响
Effects of annealing temperature on the structrue, surface morphology and electrochemical properties of the vanadium oxide thin film
以乙酰丙酮氧钒（C10H14O5V）、无水柠檬酸（C6H8O7）、乙二醇（C2H6O2）和水为原料，甲醇作溶剂，通过溶胶凝胶法在不同的退火温度250℃、350℃、450℃下制备得到钒的氧化物（VOx）薄膜材料。通过X射线衍射（XRD）、扫描电子显微镜（SEM）来分别对样品的结构和形貌进行表征。同时，利用三电极测试系统对不同温度下制备的薄膜材料进行循环伏安（CV）和电化学阻抗谱分析（EIS）等性能测试。结果表明，在温度为350℃下退火得到的薄膜材料具有较好的比容量，较小的阻抗。
he vanadium oxide thin film (VOx) was synthesized by sol-gel method under different annealing temperature, using C10H14O5V, C6H8O7, C2H6O2 and H2O as raw materials, and methyl glycol as the solvent. The morphologies and structures of the samples were charactered by X-ray diffraction (XRD), scanning electron microscopy (SEM). Electrochemical performance, inculding cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS), were investigated in a three-electrode system carried out in an electrochemical workstation. The result shows that the thin film material possesses a high specific capacity and low impedance when the annealing temperature is 350℃.
胡文成、尹嘉琳、张浩、骆佳秋
材料科学
应用化学溶胶凝胶法退火温度钒氧化物
applied chemistrysol-gel methodannealing temperatureVOx
胡文成,尹嘉琳,张浩,骆佳秋.退火温度对VOx薄膜的结构、形貌和电化学性能的影响[EB/OL].(2016-08-10)[2025-08-02].http://www.paper.edu.cn/releasepaper/content/201608-63.点此复制
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